Ion implanter K2MV with RBS-analysis system

Ion implanter based on accelerator K2MV (HVEE, Netherlands) with the Rutherford backscattering spectroscopy (RBS-analysis) to perform a number of unique applications that requiremedium and high ion energies, such as:

• analysis of various structures by RBS;
• implantation of different chemical elements ions with a minimum loss of implantable element caused by the scattering of primary ions;
• heavy ion implantation;
• molecular and cluster ions implantation;
• forming of custom implanted impurity distributions by varying within a wide range of primary particle energy.